An efficient proximity-effect correction method for electron-beam patterning of photonic-crystal devices
| Autor: | Wüest, R. ∗, Strasser, P., Jungo, M., Robin, F., Erni, D., Jäckel, H. |
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| Zdroj: | In Microelectronic Engineering 2003 67:182-188 |
| Databáze: | ScienceDirect |
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