Stability of DRAM-devices with respect to 75 keV helium ion beam irradiation as required for ion projection lithography of critical layers
| Autor: | Hirscher, S. ∗, Kümmel, M., Wolter, A., Kaesmaier, R., Jaeschke, A. |
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| Zdroj: | In Microelectronic Engineering 2002 61:351-355 |
| Databáze: | ScienceDirect |
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