Resistless patterning of quantum nanostructures by local anodization with an atomic force microscope

Autor: Bouchiat, V. , Faucher, M., Fournier, T., Pannetier, B., Thirion, C., Wernsdorfer, W., Clément, N., Tonneau, D., Dallaporta, H., Safarov, S., Villegier, J.C., Fraboulet, D., Mariolle, D., Gautier, J.
Zdroj: In Microelectronic Engineering 2002 61:517-522
Databáze: ScienceDirect