Combination multiple focal planes and PSM for sub 120 nm node with KrF lithography: study of the proximity effects
| Autor: | Manakli, S. ∗, Trouiller, Y., Schiavone, P., Spinelli, P., Le-Borgne, O., Chollet, J.-P., Rody, Y., Goirand, P.-J. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2002 61:123-132 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect