High power EUV sources based on gas discharge plasmas and laser produced plasmas

Autor: Schriever, G. , Stamm, U., Gäbel, K., Darscht, M., Borisov, V., Khristoforov, O., Vinokhodov, A.
Zdroj: In Microelectronic Engineering 2002 61:83-88
Databáze: ScienceDirect