Multiple imprinting in UV-based nanoimprint lithography: related material issues

Autor:	Bender, M. ∗, Otto, M., Hadam, B., Spangenberg, B., Kurz, H.
Zdroj:	In Microelectronic Engineering 2002 61:407-413
Databáze:	ScienceDirect
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect