Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues
| Autor: | Gusev, E.P ∗, Cartier, E, Buchanan, D.A, Gribelyuk, M, Copel, M, Okorn-Schmidt, H, D’Emic, C |
|---|---|
| Zdroj: | In Microelectronic Engineering 2001 59(1):341-349 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect