Effects of substrate bias and temperature during titanium sputter-deposition on the phase formation in TiSi 2
Autor: | Lundqvist, N ∗, Åberg, J, Nygren, S, Björmander, C.-Å, Zhang, S.-L |
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Zdroj: | In Microelectronic Engineering 2002 60(1):211-220 |
Databáze: | ScienceDirect |
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