Reduction of post exposure delay time and contamination sensitivity in chemically amplified resists: application for lithography using off-line environment
| Autor: | Pain, L. ∗, Scarfogliere, B., Tedesco, S., Gourgon, C., Coulomb, J.P., Morin, M., Ribeiro, M. |
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| Zdroj: | In Microelectronic Engineering 2001 57:511-516 |
| Databáze: | ScienceDirect |
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