Stress analysis in Si membranes for open stencil masks and mini-reticles using double bulging and resonance methods
| Autor: | Degen, A. ∗, Abedinov, N., Gotszalk, T., Sossna, E., Kratzenberg, M., Rangelow, I.W. |
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| Zdroj: | In Microelectronic Engineering 2001 57:425-432 |
| Databáze: | ScienceDirect |
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