Reactive ion etching of deeply etched DBR-structures with reduced air-gaps for highly reflective monolithically integrated laser mirrors
| Autor: | Avary, K. ∗, Rennon, S., Klopf, F., Reithmaier, J.P., Forchel, A. |
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| Zdroj: | In Microelectronic Engineering 2001 57:593-598 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect