Prediction of resolution using wet-develop type single layer and dry-development process for EUV lithography
| Autor: | Mori, Shigeyasu, Shirayone, Shigeru, Irie, Shigeo, Matsuzawa, Nobuyuki, Oizumi, Hiroaki, Yano, Ei, Okazaki, Shinji, Miyafuji, Atsushi, Watanabe, Takeo, Kinoshita, Hiroo, Oshio, Tetsuya, Sugisaki, Katsumi |
|---|---|
| Zdroj: | In Microelectronic Engineering 2000 53(1):689-692 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect