The effect of amino acid addition in CeO2-based slurry on SiO2/Si3N4 CMP: Removal rate selectivity, morphology, and mechanism research
| Autor: | Han, Xinyu, Zhang, Shihao, Liu, Renhao, Wang, Fangyuan, Tan, Baimei, Zhao, Xinyu, Zhao, Jiadong, Shi, Yunhui |
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| Zdroj: | In Journal of Molecular Liquids 15 October 2024 412 |
| Databáze: | ScienceDirect |
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