Diffusion barrier properties of atomic layer deposited TiSiN films
| Autor: | Lee, Sang Young, Mack, Jerry, Young Kim, Hae, Jung, Sung-Hoon, Rathi, Somilkumar J., Mukherjee, Niloy |
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| Zdroj: | In Materials Letters 15 May 2022 315 |
| Databáze: | ScienceDirect |
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