Ti/Ni/Au contacts to n-SiC after low energy implantation
Autor: | Leech, Patrick W, Holland, Anthony S, Reeves, Geoffrey K, Pan, Yue, Ridgway, Mark, Tanner, Phillip |
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Zdroj: | In Materials Letters 1 March 2016 166:39-42 |
Databáze: | ScienceDirect |
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