Local distribution of residual stress of Cu in LSI interconnect
| Autor: | Sato, Hisashi, Shishido, Nobuyuki, Kamiya, Shoji, Koiwa, Kozo, Omiya, Masaki, Nishida, Masahiro, Suzuki, Takashi, Nakamura, Tomoji, Nokuo, Takeshi |
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| Zdroj: | In Materials Letters 1 December 2014 136:362-365 |
| Databáze: | ScienceDirect |
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