In-situ electrical resistance measurement for determining minimum continuous thickness of Sn films by DC magnetron sputtering

Autor: Kwon, Se-Hun, Kwon, Na-Hyun, Song, Pung-Keun, Hui, Kwun Nam, Hui, Kwan-San, Cho, Young-Rae
Zdroj: In Materials Letters 15 April 2012 73:62-64
Databáze: ScienceDirect