In-situ electrical resistance measurement for determining minimum continuous thickness of Sn films by DC magnetron sputtering
Autor: | Kwon, Se-Hun, Kwon, Na-Hyun, Song, Pung-Keun, Hui, Kwun Nam, Hui, Kwan-San, Cho, Young-Rae |
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Zdroj: | In Materials Letters 15 April 2012 73:62-64 |
Databáze: | ScienceDirect |
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