Boron thin film deposition by using Thermionic Vacuum Arc (TVA) technology

Autor: Akan, T., Ekem, N., Pat, S., Issever, U.G., Balbag, M.Z., Cenik, M.I., Vladoiu, R., Musa, G.
Zdroj: In Materials Letters 2007 61(1):23-26
Databáze: ScienceDirect