Machine learning-based modeling and operation of plasma-enhanced atomic layer deposition of hafnium oxide thin films
| Autor: | Ding, Yangyao, Zhang, Yichi, Chung, Ho Yeon, Christofides, Panagiotis D. |
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| Zdroj: | In Computers and Chemical Engineering 4 January 2021 144 |
| Databáze: | ScienceDirect |
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