Mask of amorphous hydrogenated carbon films applied to chemical polishing and chemical dicing of silicon wafers
| Autor: | Fissore, Alfeu, Alves, Marco A.R., da Silva Braga, Edmundo *, Cescato, Lucila |
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| Zdroj: | In Vacuum 1999 55(1):23-25 |
| Databáze: | ScienceDirect |
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