Fabrication of tantalum silicate films with low TCR and low resistivity by magnetron sputtering
| Autor: | Chen, Cheng-Lung, Huang, Cheng, Chen, Sheng-Chi, Liu, Yen-Chen, Chuang, Min-Chen, Wen, Chao-Kuang, Huang, Wei-Sheng, Yang, Wen-Sheng, Chen, Yang-Yuan |
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| Zdroj: | In Vacuum August 2024 226 |
| Databáze: | ScienceDirect |
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