Dual low pressure plasma process for SiCN:H thin films deposition: A comparative study
Autor: | Hugon, R., Al Hallak, Z., Ahmad, A., Naja, A., Belmonte, T., Belmahi, M. |
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Zdroj: | In Vacuum January 2024 219 Part A |
Databáze: | ScienceDirect |
Externí odkaz: |