Dual low pressure plasma process for SiCN:H thin films deposition: A comparative study
| Autor: | Hugon, R., Al Hallak, Z., Ahmad, A., Naja, A., Belmonte, T., Belmahi, M. |
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| Zdroj: | In Vacuum January 2024 219 Part A |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Hugon, R., Al Hallak, Z., Ahmad, A., Naja, A., Belmonte, T., Belmahi, M. |
|---|---|
| Zdroj: | In Vacuum January 2024 219 Part A |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect