Two-regime property dependence on plasma power of plasma-enhanced atomic layer-deposited In2O3 thin films and underlying mechanism

Autor:	Zhang, Zhi-Xuan, Zhao, Ming-Jie, Wu, Wan-Yu, Wuu, Dong-Sing, Gao, Peng, Lien, Shui-Yang, Zhu, Wen-Zhang
Zdroj:	In Vacuum October 2023 216
Databáze:	ScienceDirect
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect