Oxygen plasma cleaning of copper for photocathode applications: A MEIS and XPS study
| Autor: | Noakes, T.C.Q., Valizadeh, R., Hannah, A.N., Jones, L.B., Militsyn, B.L., Mistry, S., Cropper, M.D., Rossall, A., Van den Berg, J.A. |
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| Zdroj: | In Vacuum November 2022 205 |
| Databáze: | ScienceDirect |
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