Grain boundary diffusion of Si in polycrystalline copper film

Autor: Bodnár, Eszter, Takáts, Viktor, Fodor, Tamás, Hakl, József, Kaganovskii, Yuri, Yang, Guang, Yao, Xiaogang, Vad, Kálmán
Zdroj: In Vacuum September 2022 203
Databáze: ScienceDirect