Etching characteristics of low-k SiCOH thin films under fluorocarbon-based plasmas
| Autor: | Comeaux, Jacob, Wirth, William, Courville, Justin, Baek, Nam-Wuk, Jung, Donggeun, Jang, Seonhee |
|---|---|
| Zdroj: | In Vacuum August 2022 202 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect