High mobility silicon indium oxide thin-film transistor fabrication by sputtering process

Autor: Arulkumar, S., Parthiban, S., Kwon, J.Y., Uraoka, Y., Bermundo, J.P.S., Mukherjee, Arka, Das, Bikas C.
Zdroj: In Vacuum May 2022 199
Databáze: ScienceDirect