Ti thin films deposited by high-power impulse magnetron sputtering in an industrial system: Process parameters for a low surface roughness
| Autor: | Suliali, Nyasha J., Goosen, William E., Janse van Vuuren, Arno, Olivier, Ezra J., Bakhit, Babak, Högberg, Hans, Darakchieva, Vanya, Botha, Johannes R. |
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| Zdroj: | In Vacuum January 2022 195 |
| Databáze: | ScienceDirect |
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