Methane as a novel doping precursor for deposition of highly conductive ZnO thin films by magnetron sputtering

Autor: Vasin, A.V., Rusavsky, A.V., Bortchagovsky, E.G., Gomeniuk, Y.V., Nikolenko, A.S., Strelchuk, V.V., Yatskiv, R., Tiagulskyi, S., Prucnal, S., Skorupa, W., Nazarov, A.N.
Zdroj: In Vacuum April 2020 174
Databáze: ScienceDirect