Methane as a novel doping precursor for deposition of highly conductive ZnO thin films by magnetron sputtering
Autor: | Vasin, A.V., Rusavsky, A.V., Bortchagovsky, E.G., Gomeniuk, Y.V., Nikolenko, A.S., Strelchuk, V.V., Yatskiv, R., Tiagulskyi, S., Prucnal, S., Skorupa, W., Nazarov, A.N. |
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Zdroj: | In Vacuum April 2020 174 |
Databáze: | ScienceDirect |
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