Effect of plasma power on properties of hydrogenated amorphous silicon carbide hardmask films deposited by PECVD
| Autor: | Kwon, Sungyool, Park, Yoonsoo, Ban, Wonjin, Youn, Chulmin, Lee, Sungwoo, Yang, Jaeyoung, Jung, Donggen, Choi, Taekjib |
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| Zdroj: | In Vacuum April 2020 174 |
| Databáze: | ScienceDirect |
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