Comparison of plasma properties in normal and multiple holes hollow cathode RF PECVD and their utility in a-SiNx:H thin film deposition
| Autor: | Sahu, B.B., Kim, Seok H., Lee, J.S., Han, Jeon G. |
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| Zdroj: | In Vacuum February 2019 160:316-324 |
| Databáze: | ScienceDirect |
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