The role of thermal processes and target evaporation in formation of self-sputtering mode for copper magnetron sputtering
| Autor: | Bleykher, G.A., Yuryeva, A.V., Shabunin, A.S., Krivobokov, V.P., Sidelev, D.V. |
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| Zdroj: | In Vacuum June 2018 152:156-165 |
| Databáze: | ScienceDirect |
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