Effect of post-annealing on laser-ablation deposited WS2 thin films

Autor: Wang, H., Ng, S.M., Wong, H.F., Wong, W.C., Lam, K.K., Liu, Y.K., Fei, L.F., Zhou, Y.B., Mak, C.L., Wang, Y., Leung, C.W.
Zdroj: In Vacuum June 2018 152:239-242
Databáze: ScienceDirect