Plasma characteristics and properties of Cu films prepared by high power pulsed magnetron sputtering
| Autor: | Wu, B.H., Wu, J., Jiang, F., Ma, D.L., Chen, C.Z., Sun, H., Leng, Y.X., Huang, N. |
|---|---|
| Zdroj: | In Vacuum January 2017 135:93-100 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect