Investigation on morphology and evolution process of plasma induced pitting damage during the ICP etching of fused silica

Autor: Jiang, Xiaolong, Liu, Ying, Muhutijiang, Bilali, Liu, Zhengkun, Qiu, Keqiang, Xu, Xiangdong, Hong, Yilin, Fu, Shaojun
Zdroj: In Vacuum January 2016 123:121-125
Databáze: ScienceDirect
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