Investigation on morphology and evolution process of plasma induced pitting damage during the ICP etching of fused silica
Autor: | Jiang, Xiaolong, Liu, Ying, Muhutijiang, Bilali, Liu, Zhengkun, Qiu, Keqiang, Xu, Xiangdong, Hong, Yilin, Fu, Shaojun |
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Zdroj: | In Vacuum January 2016 123:121-125 |
Databáze: | ScienceDirect |
Externí odkaz: |
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