Investigation of TaN as the wet etch stop layer for HKMG-last integration in the 22 nm and beyond nodes CMOS technology
| Autor: | Cui, Hushan, Luo, Jun, Xu, Jing, Gao, Jianfeng, Xiang, Jinjuan, Tang, Zhaoyun, Wang, Xiaolei, Lu, Yihong, He, Xiaobin, Li, Tingting, Tang, Bo, Yu, Jiahan, Yang, Tao, Yan, Jiang, Li, Junfeng, Zhao, Chao, Ye, Tianchun |
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| Zdroj: | In Vacuum September 2015 119:185-188 |
| Databáze: | ScienceDirect |
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