Influence of hydrogen plasma thermal treatment on the properties of ZnO:Al thin films prepared by dc magnetron sputtering

Autor:	Castro, M.V., Cerqueira, M.F., Rebouta, L., Alpuim, P., Garcia, C.B., Júnior, G.L., Tavares, C.J.
Zdroj:	In Vacuum September 2014 107:145-154
Databáze:	ScienceDirect
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect