Dielectric properties of SiOx like films deposited from TMS/O2 mixture in low pressure microwave plasma
| Autor: | Kihel, M., Sahli, S., Zenasni, A., Raynaud, P., Segui, Y. |
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| Zdroj: | In Vacuum September 2014 107:264-268 |
| Databáze: | ScienceDirect |
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