Deposition of microcrystalline intrinsic silicon by the Electrical Asymmetry Effect technique
| Autor: | Hrunski, D., Mootz, F., Zeuner, A., Janssen, A., Rost, H., Beckmann, R., Binder, S., Schüngel, E., Mohr, S., Luggenhölscher, D., Czarnetzki, U., Grabosch, G. |
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| Zdroj: | In Vacuum January 2013 87:114-118 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect