Studies of radiofrequency plasma deposition of hexamethyldisiloxane films and their thermal stability and corrosion resistance behavior
| Autor: | Choudhury, Arup Jyoti, Chutia, Joyanti, Kakati, Hemen, Barve, Shruti A., Pal, Arup Ratan, Sarma, Neelotpal Sen, Chowdhury, Devasish, Patil, Dinkar S. |
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| Zdroj: | In Vacuum 2010 84(11):1327-1333 |
| Databáze: | ScienceDirect |
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