High rate reactive deposition of TiO 2 films using two sputtering sources
| Autor: | Hoshi, Yoichi, Ishihara, Daiki, Sakai, Tetsuya, Kamiya, Osamu, Lei, Hao |
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| Zdroj: | In Vacuum 2010 84(12):1377-1380 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Hoshi, Yoichi, Ishihara, Daiki, Sakai, Tetsuya, Kamiya, Osamu, Lei, Hao |
|---|---|
| Zdroj: | In Vacuum 2010 84(12):1377-1380 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect