Effect of HCl addition on the crystalline fraction in silicon thin films prepared by hot-wire chemical vapor deposition
| Autor: | Chung, Yung-Bin, Lee, Dong-Kwon, Kim, Chan-Soo, Hwang, Nong-Moon |
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| Zdroj: | In Vacuum 2009 83(12):1431-1434 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect