Fluorine-doped SiO 2 and CF low- k dielectrics obtained during RIE process in fluorine plasmas

Autor:	Kalisz, Małgorzata, Beck, R.B., Ćwil, M.
Zdroj:	In Vacuum 2008 82(10):1040-1045
Databáze:	ScienceDirect
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect