Dielectric substrate self-bias and plasma confinement in two-dimensional scanning radio frequency plasma-enhanced chemical vapour deposition
| Autor: | Yin, Y., Pan, Y.Q., Hang, L., Bilek, M.M.M., McKenzie, D., Rubanov, S. |
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| Zdroj: | In Vacuum 2006 81(4):441-445 |
| Databáze: | ScienceDirect |
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