Development of filtered DC metal plasma ion implantation and coating deposition methods based on high-frequency short-pulsed bias voltage application
| Autor: | Ryabchikov, A.I., Ryabchikov, I.A., Stepanov, I.B. |
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| Zdroj: | In Vacuum 2005 78(2):331-336 |
| Databáze: | ScienceDirect |
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