Behaviors of carrier concentrations and mobilities in indium–tin oxide thin films by DC magnetron sputtering at various oxygen flow rates
| Autor: | Lee, Ho-Chul *, Ok Park, O. |
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| Zdroj: | In Vacuum 17 December 2004 77(1):69-77 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect