Iron silicide formed in a-Si:Fe thin films by magnetron co-sputtering and ion implantation
Autor: | Nikolaeva, M *, Sendova-Vassileva, M, Dimova-Malinovska, D, Karpuzov, D, Pivin, J.C, Beshkov, G |
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Zdroj: | In Vacuum 2002 69(1):221-225 |
Databáze: | ScienceDirect |
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