Iron silicide formed in a-Si:Fe thin films by magnetron co-sputtering and ion implantation

Autor: Nikolaeva, M *, Sendova-Vassileva, M, Dimova-Malinovska, D, Karpuzov, D, Pivin, J.C, Beshkov, G
Zdroj: In Vacuum 2002 69(1):221-225
Databáze: ScienceDirect