TiO 2− X sputter for high rate deposition of TiO 2
| Autor: | Tachibana, Yuko *, Ohsaki, Hisashi, Hayashi, Atsushi, Mitsui, Akira, Hayashi, Yasuo |
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| Zdroj: | In Vacuum 2000 59(2):836-843 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Tachibana, Yuko *, Ohsaki, Hisashi, Hayashi, Atsushi, Mitsui, Akira, Hayashi, Yasuo |
|---|---|
| Zdroj: | In Vacuum 2000 59(2):836-843 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect