Effect of d.c. bias on the deposition rate using r.f.–d.c. coupled magnetron sputtering for SnN x thin films
| Autor: | Kamei, R, Migita, T, Tanaka, T *, Kawabata, K |
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| Zdroj: | In Vacuum 2000 59(2):764-770 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Kamei, R, Migita, T, Tanaka, T *, Kawabata, K |
|---|---|
| Zdroj: | In Vacuum 2000 59(2):764-770 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect